SSM provides process control and characterization systems for sub-2 nm gate oxides, high-k gate dielectrics, oxynitride gate stacks, low-k dielectrics, implantation/anneal, epitaxial silicon, silicon-on-insulator (SOI), and other critical applications. In 1990, SSM introduced the first highly repeatable mercury (Hg) probe mapping system for epitaxial silicon and implant profiling. In 2001, SSM introduced the revolutionary FastGate® 6000 series of nondestructive electrical monitoring systems for in-line measurements of electrical oxide thickness, leakage current, implant dose, and other parameters on product wafers. In 2008, SSM introduced the NeoMetrikTM system for in-line characterization of low-k dielectric films.
SSM is headquartered in Pittsburgh, Pennsylvania and has direct support facilities in China, Europe, Japan, Korea, Singapore, and Taiwan. SSM's applications labs are continually developing new applications for products based on SSM technologies.
110 Technology Drive, Pittsburgh, PA 15275 -- ph.+1-412-787-0620, fax+1-412-787-0630