SSM 495 System

The SSM 495 CV Measurement System provides automatic mapping and a variety of electrical characterization measurements for non-patterned wafers used in epitaxial silicon and front-end semiconductor process development and production. Measurements performed include Schottky Diode and MOS CV. The SSM 495 eliminates the need for costly metal and poly deposition processes by using a pneumatically controlled, non-damaging probe design and a top-side mercury contact. With separate probe and chuck vacuum lines, the system features an extremely stable contact area and uses only a small quantity of mercury to make highly repeatable measurements for process development and process monitoring applications. Typical SSM 495 applications • EPI resistivity • Low-k dielectric constant • Oxide integrity • Thin film read-heads • Flat panel displays SSM 495 features • Wafer diameter from 75 mm to 200 mm • Single-site and multiple-site maps • Face-up site loading prevents wafer damage • Precision pressure regulators for Hg contact • PROCAP software provides a full suite of measurements To request information or technical papers click here or write to us at info@ssm-inc.com.

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